[ROUND LAB] Pine Calming Cica Mask - 10EA

After cleansing and toning, leave mask on for 10 - 20 minutes. After removal, tap lightly across face for residual contents to be fully absorbed.

Water, Pinus Densiflora Leaf Extract, Glycerin, Dipropylene
Glycol, Glycereth-26, Centella Asiatica Extract, Hyaluronic
Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate,
Butylene Glycol , Portulaca Oleracea Extract, Propanediol ,
Chondrus Crispus , Ethylhexylglycerin, Biosaccharide Gum-
1, Glycoproteins , Ammonium Polyacryloyldimethyl Taurate,
Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside,
Asiatic Acid, Madecassoside, Madecassic Acid ,
Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid,
Hydroxyethylcellulose, 1,2-Hexanediol,
Hydroxyacetophenone, Disodium EDTA, Xanthan Gum,
Carbomer

• We continuously seek to provide the best description of our online products to all consumers around the world. However, governed by the relevant Korean law and regulatory guidance, word(s) or phrases such as “natural,” “organic,” “more radiant,” “immediately hydrates,” “high performance,” and “hypoallergenic,” are translations of approved Korean words or phrases that maybe used to describe a product or communicate with the general consumers in Korea. Therefore, depending on your location, your understanding of the descriptive words and phrases you see on our website may vary from our intended use.
• There may be some changes to the product, such as changes in packaging design or product name. Please note that renewed products may be delivered.